Photoresist is a critical material in semiconductor manufacturing, and photo-initiators—key components of photoresists—directly determine their photosensitivity and resolution. In recent years, as the global semiconductor supply chain shifts toward China and national strategies promoting domestic substitution intensify, demand for high-end photoresists and their essential raw material, photo-initiators, has surged. This trend has prompted a wave of Chinese electronic chemical companies to invest in the independent R&D and industrialization of photo-initiators, gradually breaking the long-standing foreign monopoly in this field.Currently, mainstream photo-initiators fall into two categories: free-radical and cationic types, widely used in various lithography processes such as g-line, i-line, KrF, and ArF. With the advancement of EUV (Extreme Ultraviolet) lithography, there is growing demand for new-generation photo-initiators that offer higher efficiency, ultra-high purity, and ultra-low metal impurity levels. Domestic enterprises are enhancing product performance and mass production capabilities through industry-academia collaboration, recruitment of top-tier talent, and construction of cleanroom manufacturing lines.On the policy front, China’s 14th Five-Year Plan for National Strategic Emerging Industries explicitly supports breakthroughs in advanced electronic materials, providing strong backing for the localization of photo-initiators. In the coming years, with technological advancements and capacity expansion, domestically produced photo-initiators are expected to rapidly enter the market—not only meeting the needs of local photoresist manufacturers but also potentially integrating into the global semiconductor supply chain, contributing to its diversification.
光刻胶是半导体制造中的关键材料，而光引发剂作为其核心组分之一，直接决定了光刻胶的感光性能与分辨率。近年来，随着全球半导体产业链加速向中国转移，以及国产替代战略的深入推进，国内对高端光刻胶及其关键原材料——光引发剂的需求迅速增长。在此背景下，一批专注于电子化学品研发的企业开始布局光引发剂的自主研发与产业化，逐步打破国外企业在该领域的长期垄断。目前，主流光引发剂包括自由基型和阳离子型两大类，广泛应用于g线、i线、KrF、ArF等不同波长的光刻工艺中。随着EUV（极紫外）光刻技术的发展，对新型高效、高纯度、低金属杂质含量的光引发剂提出了更高要求。国内企业正通过产学研合作、引进高端人才、建设洁净生产线等方式，提升产品性能与量产能力。政策层面，《“十四五”国家战略性新兴产业发展规划》明确提出支持先进电子材料攻关，为光引发剂的国产化提供了有力支撑。预计未来几年，随着技术突破和产能释放，国产光引发剂将加速走向市场，不仅满足本土光刻胶厂商需求，也有望进入国际供应链体系，助力全球半导体产业链多元化发展。
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